Invited Speakers

Geoff Hassall
Oxford Instruments, UK

“Chasing convergence - Plasma application at the nano-scale?”

Geoff is a plasma physicist by training, an engineer and technologist during the working day, but at heart is an Inventor and an innovator. His research career started looking at pollution control using pulsed plasma technology, then via AWE Aldermaston and high energy pulse-power physics and engineering, finally arriving in the semiconductor world around the turn of the century to study plasmas for the production, modification and manipulation of materials and surfaces at the nanoscale. In recent years, he has been developing his Innovation team to support current OIPT products, and develop the products yet to come. Oxford Instruments Plasma Technology is a leading provider of etch and deposition process solutions for nanometre-sized features, nanolayers, and the controlled growth of nanostructures.


Prof Claudia Riccardi
University of Milano-Bicocca, Italy

“Plasma Techniques for Nanostructured Materials”

Claudia is the Scientific Director of Plasma Prometeo Centre of Milano and an Associate Professor in the Department of Physics, University of Milano-Bicocca. She has authored more than 150 publications in the field of plasma physics that illustrate the diversity of her scientific interests. She started to work on basic plasma physics research in the field of plasma wave-interactions (1989-1996) and later in the field of the plasma turbulence (1996-present). Since 1998 Claudia has also been working on plasma applications for industry, developing plasma sources, diagnostics and processes, which have expanded our current understanding of plasma-material interaction and widened the range of industrial plasma applications.


Dr. Magdalena Nistor
National Institute for Lasers, Plasmas and Radiation Technology, Bucharest, Romania

“Characterization of Ablation Plasma in Pulsed Electron Beam Deposition”

Magdalena is a plasma physicist conducting experimental research on the growth of oxide thin films by pulsed electron beam deposition and pulsed laser deposition. She works on the characterization of pulsed electron beams produced in transient hollow cathode discharges, plasma diagnostics and pulsed plasma sources for thin film deposition. Her research cover fundamental science related to oxide thin film composition and structure, applied research through “passive” or “active” properties of oxide thin films and device development.


Dr. Alex Paterson
Lam Research, USA

“The Role of Diagnostics in Plasma Etch Reactors in Enabling the Information Age”

Alex Paterson received the B.Sc and D.Phil degrees in Physics from the University of Strathclyde, Glasgow, Scotland in 1994 and 1998, respectively. In 1998, he moved to Santa Clara, CA, to join Applied Materials’ etch division where he became a member of the RF plasma technology team. He was involved in developing and producing novel plasma technologies for 200 mm and 300 mm wafer processing of next generation IC feature sizes, ranging from 0.35 µm to sub-45 nm, for conductor and dielectric etch applications. In 2007 he moved to LAM Research where he is currently a Managing Director for the Conductor Etch division. He now manages a group of scientists responsible for concept and feasibility studies of enabling plasma technologies. Dr Paterson is a member of the Institute of Physics and a Chartered Physicist (C.Phys) and was a member of the Department of Energy’s (DOE) study for identifying the challenges facing low temperature plasmas over the next ten years. He has over 18 publications in the low temperature plasma field, given invited talks on rf plasma processing technologies and has over 76 patents granted with currently 15 patents pending.

 

 

 The Institute of Physics - Plasma Physics Group  Vacuum Expo Vacuum Symposium Loughborough University